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本文叙述了我们设计改装的直流平面磁控溅射系统和用以淀积氧化锌压电薄膜的性能。 给出了磁控电极的结构和磁场分布;测量了系统的放电特性和淀积速率与混合气体压力、靶的输入功率的关系及磁控电极淀积的氧化锌薄膜的厚度分布;提出了提高靶材利用率的简单方法。最后,给出了用此系统淀积的氧化锌薄膜及其体波实验器件的实验结果。
This article describes the DC planar magnetron sputtering system we designed and adapted to deposit zinc oxide piezoelectric films. The structure and magnetic field distribution of the magnetron electrode are given. The relationship between the discharge characteristics of the system and the deposition rate, the pressure of the mixed gas and the input power of the target and the thickness distribution of the zinc oxide film deposited by the magnetron electrode are measured. A simple method of target utilization. Finally, the experimental results of zinc oxide films deposited by this system and their bulk wave experimental devices are given.