Cl2Ar相关论文
Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can incr......
采用AZ1500光刻胶作为掩模对GaAs和InP进行ICP刻蚀, 研究了刻蚀参数对光刻胶掩模及刻蚀图形侧壁的影响。结果表明, 光刻胶的碳化变......
采用Cl2/Ar感应耦合等离子体(ICP)对单晶硅进行了刻蚀,工艺中用光刻胶作掩膜。研究了气体组分、ICP功率和RF功率等工艺参数对硅刻......
