论文部分内容阅读
采用I-V亚阈测量技术,分析了封闭栅和条形栅结构CMOS/SOS器件的logI-V曲线亚阈斜率和阈电压的总剂量电离辐照特性,以及不同的辐照偏置条件对上述两个电参数的影响。结果表明,在总剂量辐照下,封闭棚和条形栅CMOS/SOS器件的阈电压及logI-V曲线亚阈斜率的变化趋势基本相同。
The I-V subthreshold measurement technique was used to analyze the total dose ionizing radiation characteristics of the sub-threshold slopes and threshold voltages of the logI-V curve in the closed-gate and the bar-gate CMOS / SOS devices and the different irradiation bias conditions The impact of these two electrical parameters. The results show that the threshold voltages and the subthreshold slopes of the log I-V curves of the CMOS / SOS devices are basically the same under the total dose irradiation.