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采用直流磁控溅射的方法制备出Ir金属纳米粒子薄膜.利用扫描电子显微镜分析了纳米粒子的形态和分布以及不同工艺条件对粒子粒径及形貌的影响,表明纳米粒子的大小可通过调节溅射气体压强来控制.在25%孔度的W海绵基体内浸入6∶1∶2铝酸盐发射物质,然后在其表面沉积上厚度为200—500nm的纳米粒子薄膜层,最后在H2气中1200℃烧结,即制成了新型纳米粒子薄膜阴极.利用阴极发射微观均匀性测试仪对纳米粒子薄膜阴极和传统覆膜阴极的热电子发射的均匀性进行了对比研究.采用飞行时间质谱仪测试了真空本底、纳米粒子薄膜阴极、传统覆膜阴极等各种阴极蒸发物的成分,研究了阴极蒸发速率与阴极温度的关系,比较了不同阴极蒸发速率的大小.研究了Ba-W阴极覆上纳米粒子薄膜后的发射特性.
Ir metal nanoparticle films were prepared by DC magnetron sputtering.The morphology and distribution of the nanoparticles and the influence of different process conditions on the particle size and morphology were analyzed by scanning electron microscopy.The results showed that the size of the nanoparticles can be controlled by adjusting Sputtering gas pressure to control the penetration of 25% porosity W sponge matrix 6: 1: 2 aluminate emission material, and then deposited on the surface of the film thickness of 200-500nm nanoparticle film, and finally H2 gas And sintered at 1200 ℃, a novel nanoparticle film cathode was made.The uniformity of the thermal electron emission of the cathode of the nanoparticle film and that of the conventional film cathode was compared by using the cathode emission microscopic homogeneity tester.The time-of-flight mass spectrometer The composition of cathodic evaporation, such as vacuum background, nanoparticle film cathode and traditional coated cathode, was tested and the relationship between cathode evaporation rate and cathode temperature was studied and the evaporation rates of different cathodes were compared.The effects of Ba-W cathodes Emission characteristics after coating with nano-particle film.