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分别通过曲率法和基体拉伸应变测试方法研究TiO2纳米管薄膜的残余应力和脱层行为。结果表明:TiO2纳米管薄膜的内残余应力为-54MPa。TiO2纳米管薄膜室温样、250°C退火样和400°C退火样的脱层出现点的应变依次为2.6%、5.1%和8.6%,半径依次为27.5、17.1和19.4μm。TiO2纳米管薄膜室温样、250°C退火样和400°C退火样的真实临界脱层应力为220.4、394.5和627.9MPa。在脱层条件下,对界面剪滞模型进行修订,并对TiO2纳米管薄膜界面剪切强度进行多项式拟合。由于拟合结果与裂纹密度的分析结果能很好吻合,因此界面剪滞模型的修订方程和多项式拟合方程均为可信的。
The residual stress and delamination behavior of TiO2 nanotubes films were investigated by curvature method and tensile strain test. The results show that the internal residual stress of TiO2 nanotube film is -54MPa. TiO2 nanotubes films at room temperature, 250 ° C annealed and 400 ° C annealed samples delaminated at the point of strain was 2.6%, 5.1% and 8.6%, followed by the radius of 27.5,17.1 and 19.4μm. The real critical delamination stresses for TiO2 nanotube films at room temperature, 250 ° C annealed and 400 ° C annealed were 220.4, 394.5 and 627.9 MPa. Under the conditions of delamination, the interface shear lag model was revised and the interfacial shear strength of TiO2 nanotubes was fitted by polynomial. Since the fitted results agree well with the results of the crack density analysis, both the modified equation and the polynomial fitting equation of the interface shear lag model are credible.