HiPIMS相关论文
高能脉冲磁控溅射技术（HIPIMS）以峰值功率密度高，金属离化率高为特点，较传统直流磁控溅射（DCMS）具有其独有的优势。将高能脉冲磁控溅射（HI......
为探究脉冲频率对通过高功率脉冲磁控溅射制备TiN薄膜组织力学性能的影响，选用Ti靶和N2气体，采用反应磁控溅射技术通过改变HiPIMS电......
Effects of substrate bias on the characteristics of CrN coatings deposited by DC superimposed HiPIMS
Chromium nitride coatings were deposited on glass, silicon wafer and high-speed steel substrates at room temperature by ......
Ceramic Si(B)CN Coatings for Ultra High Thermal Loads:Dependency between Synthesis Route and Coating
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Global plasma models for non-reactive and reactive depositions by modulated pulsed power magnetron s
A global plasma model has been developed to describe the MPPMS discharge process based on the particle balance and the e......
In this work,we report the parameters in novel plasma source diagnosed by optical emission spectrometry (OES) during a h......
In this study,the influence of substrate temperature on properties of A1-N co-doped p-type ZnO films is explored.Benefit......
通过改变N2气流量、沉积偏压等参数,采用高功率脉冲磁控溅射沉积技术制备Ti-B-N涂层,研究N掺杂含量对涂层相结构、力学性能及导电......
作为一种半导体材料,氧化锌的两个最主要特征:直接宽禁带和高激子束缚能。这些特性使氧化锌广泛应用于光电器件、太阳能电池等等。......
采用高功率脉冲磁控溅射（HiPIMS）技术在不同沉积温度下制备了Al-Cr-Si-N涂层。系统研究了沉积温度对涂层结构、成分、显微形貌、力学......
采用高功率脉冲磁控溅射（HiPIMS）技术在不同沉积温度下制备了Al-Cr-Si-N涂层。系统研究了沉积温度对涂层结构、成分、显微形貌、力学......
高功率脉冲磁控溅射（HIPIMS）作为一项极具发展前途的物理气相沉积新技术,近年来引起学术界和工业界的广泛关注.HIPIMS技术（也被称为HP......
采用高功率脉冲磁控溅射法在Si和高速铜基底上制备类石墨（Graphite—likecarbon，GLC）非晶碳膜，研究了基底偏压对薄膜微观结构、机械性......
高功率脉冲磁控溅射(HiPIMS)放电凭借着高离化率优势,已经成为物理气相沉积(PVD)领域的核心技术。鉴于HiPIMS放电具有复杂的物理场......
为提高磁控溅射制备薄膜的致密度,减少结构缺陷,研究薄膜显微结构对硬度、韧性及耐蚀性能的影响,尝试在改变离子源和基材偏压的条......
高功率脉冲磁控溅射(High-power impulse magnetron sputtering,HiPIMS)是一种峰值功率极高,靶材原子高度离化的离化物理气相沉积......
期刊
目的实现性能优异的CrN薄膜在低温沉积条件下的可控制备。方法利用高功率脉冲磁控溅射技术(HiPIMS),通过调控脉冲放电波形(可调控......
